SUBSTRATE TREATING APPARATUS

摘要

A substrate treating apparatus includes a front heat-treating block, a front relay block and a solution treating block. The front heat-treating block has heat-treating units and main transport mechanisms. The front relay block has receivers and transport mechanisms. The solution treating block has solution treating units and transport mechanisms for solution treatment. The front heat-treating block and front relay block are connected to be able to transport substrates reciprocally. The front relay block and solution treating block are connected to be able to transport the substrates reciprocally. The front relay block is disposed between the solution treating block and front heat-treating block.

主权项

1. A substrate treating apparatus comprising:
a front heat-treating block; a front relay block; and a solution treating block; the front heat-treating block including:
heat-treating units for heat-treating substrates; andmain transport mechanisms for transporting the substrates to the heat-treating units of the front heat-treating block; the front relay block including:
receivers for receiving the substrates; andtransport mechanisms for transporting the substrates to the receivers of the front relay block; the solution treating block including:
solution treating units for performing solution treatment of the substrates; andtransport mechanisms for solution treatment for transporting the substrates to the solution treating units; wherein the front heat-treating block and the front relay block are connected to be able to transport the substrates reciprocally; the front relay block and the solution treating block are connected to be able to transport the substrates reciprocally; and the front relay block is disposed between the solution treating block and the front heat-treating block.