发明名称 Plasma processing apparatus
摘要 Provided is a plasma processing apparatus comprising an exhaust path extending from the exhaust hole to the pump, wherein the pump is configured to depressurize inside of the processing container and the exhausting path, wherein the exhaust path includes a horizontally linearly extended portion, wherein the horizontally linearly extended portion of the exhaust path has a rectangular or oval cross-section having a horizontal length longer than a vertical length; wherein the plasma processing apparatus further includes a pressure control valve disposed in the horizontally linearly extended portion of the exhaust path; and wherein the pressure control valve is formed of a pressure control valve plate having substantially same shape and size as those of the cross-section and a shaft formed in the pressure control valve along the horizontal length of the cross-section, in such a manner that the pressure control valve plate rotates about the shaft.
申请公布号 US9574267(B2) 申请公布日期 2017.02.21
申请号 US201514609851 申请日期 2015.01.30
申请人 TOKYO ELECTRON LIMITED 发明人 Nozawa Toshihisa;Komoto Shinji;Iwasaki Masahide
分类号 C23C16/455;C23F1/00;H01L21/306;C23C16/52;C23C16/44;H01J37/32;C23C16/511;C23C16/50;C23C16/06;C23C16/22 主分类号 C23C16/455
代理机构 Cantor Colburn LLP 代理人 Cantor Colburn LLP
主权项 1. A plasma processing apparatus for performing plasma processing on a substrate to be processed, the plasma processing apparatus comprising: a processing container; a holding stage disposed inside the processing container and capable of holding the substrate thereon; a pump disposed outside the processing container; an exhaust hole under the holding stage in the processing container; an exhaust path extending from the exhaust hole to the pump, wherein the pump is configured to depressurize inside of the processing container and the exhausting path, wherein the exhaust path includes a horizontally linearly extended portion; and a shut-off valve disposed at an end portion of the exhaust path, the shut-off valve opening and closing the exhaust path, wherein the horizontally linearly extended portion of the exhaust path has a rectangular or oval cross-section having a horizontal length longer than a vertical length; wherein the plasma processing apparatus further includes a pressure control valve disposed in the horizontally linearly extended portion of the exhaust path; wherein the pressure control valve is formed of a pressure control valve plate having substantially same shape and size as those of the cross-section and a shaft formed in the pressure control valve along the horizontal length of the cross-section, in such a manner that the pressure control valve plate rotates about the shaft to thereby control a pressure at upstream and downstream sides of the pressure control valve.
地址 Tokyo JP