CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, PHOTORESIST COMPOSITION INCLUDING SAID CYCLIC COMPOUND AND METHOD FOR PRODUCING SAME, AND RESIST PATTERN FORMATION METHOD USING SAID COMPOSITION

摘要

Provided are: a cyclic compound which is useful as a photoresist material for forming a chemically amplified resist useful in microfabrication, has high solubility with respect to a safety solvent, has high sensitivity, has small roughness, and gives a good resist pattern shape; a method for producing same; a photoresist composition including said cyclic compound and a method for producing same; and a resist pattern forming method using said composition. Said cyclic compound is characterized by features shown in general formula (1).