发明名称 |
プロセスチャンバ内の複数区域ヒータの温度を制御するための方法および装置 |
摘要 |
Methods and apparatus for controlling the temperature of multi-zone heater in a process chamber are provided herein. In some embodiments, a method is provided to control a multi-zone heater disposed in a substrate support, wherein the multi-zone heater has a first zone and a second zone. In some embodiments, the method may include measuring a current drawn by the first zone at a first time; measuring a voltage drawn by the first zone at the first time; calculating the resistance of the first zone based upon the measured current and voltage drawn by the first zone at the first time; determining a temperature of the first zone based upon a predetermined relationship between the resistance and the temperature of the first zone; and adjusting the temperature of the first zone in response to the temperature determination. |
申请公布号 |
JP6080842(B2) |
申请公布日期 |
2017.02.15 |
申请号 |
JP20140511522 |
申请日期 |
2012.05.17 |
申请人 |
アプライド マテリアルズ インコーポレイテッドAPPLIED MATERIALS,INCORPORATED |
发明人 |
アンバル, ハリ キショール;ハーラー, ウーヴェ パウル;チョウ, チェンホア |
分类号 |
H01L21/31;C23C16/44;H01L21/02;H01L21/205;H01L21/683 |
主分类号 |
H01L21/31 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|