发明名称 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM USING SAME
摘要 The objective of the present invention is to provide an active light sensitive or radiation sensitive composition which can achieve excellent thermal stability, high sensitivity, and good roughness characteristics. The active light sensitive or radiation sensitive composition according to the present invention contains: (A) a compound characterized in that, in an organic-inorganic composite composition containing a metal or metalloid element, the aggregation domain size of the metal or metalloid element is 1-5 nm, and 1.2-2.0 mol times of a carboxylic acid and/or a carboxylic acid derivative exists with respect to the metal or metalloid element and forms a coordinated structure; (B) a compound (Q) that generates an acid when being irradiated with active light or radiation; and (C) an organic solvent.
申请公布号 WO2017018084(A1) 申请公布日期 2017.02.02
申请号 WO2016JP67534 申请日期 2016.06.13
申请人 FUJIFILM CORPORATION 发明人 FUJIMORI Toru;TSUCHIHASHI Toru
分类号 G03F7/004;G03F7/20 主分类号 G03F7/004
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