发明名称 Substrate processing apparatus and substrate processing method
摘要 A substrate processing apparatus includes a plurality of inlet pipes and a plurality of outlet pipes, connected to a processing tank and configured to be switched therebetween to create a flow of a processing liquid in the processing tank in a direction different from that of the processing liquid before the switching. The inlet pipes and the outlet pipes are each provided with a flow control device which is controlled by a control section so that upon the switching, a flow rate of the processing liquid flowing therethrough changes with time.
申请公布号 US9556533(B2) 申请公布日期 2017.01.31
申请号 US201213572924 申请日期 2012.08.13
申请人 EBARA CORPORATION 发明人 Kurashina Keiichi;Nakada Tsutomu
分类号 C25D5/08;C25D7/12;C25D17/02;H01L21/288;H01L21/768 主分类号 C25D5/08
代理机构 Wenderoth, Lind & Ponack, L.L.P. 代理人 Wenderoth, Lind & Ponack, L.L.P.
主权项 1. A substrate processing apparatus comprising: a control section; a processing tank configured to hold a processing liquid; a substrate holder configured to hold a substrate and bring the substrate into contact with the processing liquid in the processing tank; a plurality of inlet pipes connected to the processing tank, each of the plurality of inlet pipes comprising a mass flow controller and being configured to be switched therebetween; and a plurality of outlet pipes connected to the processing tank, each of the plurality of outlet pipes comprising a mass flow controller and being configured to be switched therebetween, and being configured to create a flow of the processing liquid along a surface of the substrate in the processing tank in a second direction different from a first direction of the flow of the processing liquid before a switching between the plurality of inlet pipes, and the control section being configured to control each of the mass flow controllers to change a flow rate of the processing liquid supplied by one of the plurality of inlet pipes to the surface of the substrate with time over 1 second to 10 seconds, upon the switching between the plurality of inlet pipes or a switching between the plurality of outlet pipes; and a pump configured to supply the processing liquid into the processing tank in a circulatory manner through the plurality of inlet pipes and the plurality outlet pipes.
地址 Tokyo JP