发明名称 |
Substrate processing apparatus and substrate processing method |
摘要 |
A substrate processing apparatus includes a plurality of inlet pipes and a plurality of outlet pipes, connected to a processing tank and configured to be switched therebetween to create a flow of a processing liquid in the processing tank in a direction different from that of the processing liquid before the switching. The inlet pipes and the outlet pipes are each provided with a flow control device which is controlled by a control section so that upon the switching, a flow rate of the processing liquid flowing therethrough changes with time. |
申请公布号 |
US9556533(B2) |
申请公布日期 |
2017.01.31 |
申请号 |
US201213572924 |
申请日期 |
2012.08.13 |
申请人 |
EBARA CORPORATION |
发明人 |
Kurashina Keiichi;Nakada Tsutomu |
分类号 |
C25D5/08;C25D7/12;C25D17/02;H01L21/288;H01L21/768 |
主分类号 |
C25D5/08 |
代理机构 |
Wenderoth, Lind & Ponack, L.L.P. |
代理人 |
Wenderoth, Lind & Ponack, L.L.P. |
主权项 |
1. A substrate processing apparatus comprising:
a control section; a processing tank configured to hold a processing liquid; a substrate holder configured to hold a substrate and bring the substrate into contact with the processing liquid in the processing tank; a plurality of inlet pipes connected to the processing tank, each of the plurality of inlet pipes comprising a mass flow controller and being configured to be switched therebetween; and a plurality of outlet pipes connected to the processing tank, each of the plurality of outlet pipes comprising a mass flow controller and being configured to be switched therebetween, and being configured to create a flow of the processing liquid along a surface of the substrate in the processing tank in a second direction different from a first direction of the flow of the processing liquid before a switching between the plurality of inlet pipes, and the control section being configured to control each of the mass flow controllers to change a flow rate of the processing liquid supplied by one of the plurality of inlet pipes to the surface of the substrate with time over 1 second to 10 seconds, upon the switching between the plurality of inlet pipes or a switching between the plurality of outlet pipes; and a pump configured to supply the processing liquid into the processing tank in a circulatory manner through the plurality of inlet pipes and the plurality outlet pipes. |
地址 |
Tokyo JP |