| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing device and a plasma processing method capable of inhibiting foreign matter from being attached to a processing surface of an object to be processed.SOLUTION: A plasma processing device includes: a processing container capable of maintaining an atmosphere having pressure reduced below the atmospheric pressure; an exhaust part which reduces the internal pressure of the processing container; a process gas introduction part which introduces process gas into the processing container; a plasma generation part which generates plasma in the inside of the processing container; and a support part which is provided inside the processing container and supports an object to be processed. Then, the plasma generation part generates the plasma above the object to be processed and the support part makes a processing surface of the object to be processed face downward to support the object to be processed. |
