| 摘要 |
A method of manufacturing an array substrate, a display substrate and a display device are disclosed. The method of manufacturing an array substrate comprises: forming a pattern of an active layer and a pattern of source and drain electrodes on a substrate; forming a pattern of a first transparent electrode and a pattern of a passivation layer through one single patterning process; and processing the substrate on which the pattern of the passivation layer having been formed, such that a material of the passivation layer fills at least partially in a gap in the pattern of the first transparent electrode. Through forming the pattern of the first transparent electrode and the passivation layer by one single patterning process, number of masks used in the manufacturing process of the array substrate is reduced. Compared with a process in prior art in which the pixel electrode and the passivation layer are obtained through two patterning processes respectively, the method of manufacturing the array substrate provided in the embodiment of the present disclosure may form both the pattern of the pixel electrode and the pattern of the passivation layer through just a single patterning process with only one mask, such that the number of masks used in the process of manufacturing the array substrate can be reduced, and in turn, the process of manufacturing the array substrate is simplified, thus, manufacturing cost for the array substrate can be reduced. |
