发明名称 SUBSTRATE SUPPORT APPARATUS HAVING REDUCED SUBSTRATE PARTICLE GENERATION
摘要 Embodiments of apparatus for supporting a substrate are disclosed herein. In some embodiments, an apparatus for supporting a substrate includes: a support surface; and a plurality of substrate contact elements protruding from the support surface, wherein the plurality of substrate contact elements are formed of a material having a hardness less than or equal to a hardness of silicon, having a low adhesion, having a coefficient of static friction large enough to prevent sliding, having a surface roughness less than or equal to 10 Ra, and that is electrically conductive.
申请公布号 EP3084818(A1) 申请公布日期 2016.10.26
申请号 EP20140871014 申请日期 2014.12.08
申请人 APPLIED MATERIALS, INC. 发明人 AGARWAL, PULKIT;SUH, SONG-MOON;MORI, GLEN;SANSONI, STEVEN V.
分类号 H01L21/683 主分类号 H01L21/683
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