| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing tool capable of cleaning and polishing while always supplying a sufficient amount of moisture to a cleaning and polishing the surface of an object, eliminating impurities such as a contamination adhered to the cleaning and polishing surface by an aggregate of fine abrasive particles with polishing ability, and preventing the fine particles from easily dropping from a sponge base material.SOLUTION: A polishing tool includes a base material composed of water-absorbing continuously porous sponge, and a large number of aggregates of polishing abrasive grains secured on the base material and spaced out across a surface of the base material. Individual aggregates of the polishing abrasive grains are composed of a large number of aggregates of the polishing abrasive grains bound by a binder. The aggregates of the polishing abrasive grains are bulged out from the surface of the base material and formed into dot shapes when viewed from the front. Metallic particles may be included in the aggregates of the polishing abrasive grains. An entire back surface of the base material is formed as a water-absorbing surface based on the water absorbability of the continuously porous sponge. |
