| 摘要 |
The invention relates to a plasma-surgical device (2), comprising a HF generator (4) for generating a HF activation signal, a gas source (6) for providing a plasma gas, and a plasma applicator (8) having a channel (14) which opens out at a distal end (16) of the applicator and through which the plasma gas can flow, and having a HF electrode that is electrically connected to the HF generator, wherein the HF electrode can be supplied with the HF activation signal such that a plasma (18) can be provided originating from the distal end (16) of the applicator. The plasma-surgical device is developed such that it comprises a control unit (28) and a through-flow regulator (30) for regulating a through flow rate of plasma gas provided by the gas source in the channel (14), wherein the control unit is configured to receive or request an operating variable of the HF generator, and, according to a recorded functional context, to control the through-flow regulator in such a way that the through-flow rate of the plasma gas is correlated with a detected value of the operating variable. |
