发明名称 SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM HAVING SUBSTRATE LIQUID PROCESSING PROGRAM STORED THEREON
摘要 The present invention provides a substrate processing liquid processing apparatus capable of preventing a crystal from being formed by reaction between a processing liquid and a cleaning fluid, a substrate processing liquid processing method, and a computer-readable storage medium having a substrate processing liquid processing program stored thereon. According to the present invention, the apparatus comprises: a processing liquid channel (concentration measurement channel (53)) where a processing liquid to process a substrate (8) is flowing; a cleaning fluid supply unit (57) to supply a cleaning fluid for cleaning at least a part of the processing liquid channel to the processing liquid channel; a heater to heat the processing liquid; and a control unit to control the cleaning fluid supply unit (57) and the heater (52). The heater (52) heats the processing liquid to a temperature higher than a temperature forming a crystal by reaction between the processing liquid and the cleaning fluid, and the heated processing liquid is supplied to the processing liquid channel where the processing liquid of the temperature forming a crystal by the reaction between the processing liquid and the cleaning fluid stays. Then, the cleaning fluid is controlled to be supplied to the processing liquid channel from the process liquid supply unit (57).
申请公布号 KR20160112951(A) 申请公布日期 2016.09.28
申请号 KR20160027457 申请日期 2016.03.08
申请人 TOKYO ELECTRON LIMITED 发明人 SATO HIDEAKI
分类号 H01L21/02;H01L21/324;H01L21/67 主分类号 H01L21/02
代理机构 代理人
主权项
地址