发明名称 ESD PROTECTION STRUCTURE USING CONTACT-VIA CHAINS AS BALLAST RESISTORS
摘要 According to an exemplary embodiment, an ESD protection structure situated in a semiconductor die includes a FET including a gate and first and second active regions, where the gate includes at least one gate finger, and where the at least one gate finger is situated between the first and second active regions. The ESD protection structure further includes at least one contact-via chain connected to the first active region, where the at least one contact-via chain includes a contact connected to a via. The at least one contact-via chain forms a ballast resistor for increased ESD current distribution uniformity. The contact is connected to the via by a first metal segment situated in a first interconnect metal layer of a die. The at least one contact-via chain is connected between the first active region and a second metal segment situated in a second interconnect metal layer of the die.
申请公布号 EP1913634(B1) 申请公布日期 2016.09.28
申请号 EP20060774513 申请日期 2006.07.05
申请人 SKYWORKS SOLUTIONS, INC. 发明人 ZHANG, JIONG;CHENG, YUHUA
分类号 H01L29/417;H01L27/02;H01L27/06;H01L29/06;H01L29/78 主分类号 H01L29/417
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