发明名称 積層方法および積層システム
摘要 PROBLEM TO BE SOLVED: To provide a lamination method and a lamination system by which a film-like laminate can be laminated well without damaging it even in the case of a brittle object to be laminated, such as a thinned semiconductor, or semiconductor including a very brittle material.SOLUTION: A lamination method for laminating a film-like laminate F to a brittle object W to be laminated comprises the steps of superposing the brittle object W to be laminated and the film-like laminate F, on each other and heating and applying a pressure to them. In the lamination method, the step of applying a pressure to the brittle object W to be laminated and the film-like laminate F includes the step of swelling an elastic film material 16 toward the brittle object W to be laminated set on a work-holder member 36 and loaded into a lamination device 12 from above in a vacuum chamber C of the lamination device 12.
申请公布号 JP5995325(B2) 申请公布日期 2016.09.21
申请号 JP20130142660 申请日期 2013.07.08
申请人 株式会社名機製作所 发明人 廣瀬 智章;岡野 敦;田島 久良;山本 隆幸
分类号 H01L21/60 主分类号 H01L21/60
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