发明名称 |
IMPLANT HAVING AN INCREASED NEGATIVE SURFACE CHARGE |
摘要 |
An implant for implantation into a body is provided with a surface that is provided for contact with the body or a bodily fluid when implanted and which surface has a first surface charge when in a first state. The surface assumes a second state having a second surface charge as a result of surface treatment, the second surface charge being a lower positive surface charge or a higher negative surface charge than the first surface charge. The implant is used for regulating an adsorption of proteins on the surface of the implant in terms of type, quantity and/or conformation of certain proteins by means of a defined second state of the surface, which has a defined second surface charge and/or a defined predetermined composition of an oxide layer of the surface. |
申请公布号 |
EP3068452(A1) |
申请公布日期 |
2016.09.21 |
申请号 |
EP20140801977 |
申请日期 |
2014.11.12 |
申请人 |
QVANTEQ AG |
发明人 |
ZUCKER, ARIK;BUZZI, STEFANO;MÄDER, ARMIN, W.;MILLERET, VINCENT;EHRBAR, MARTIN;ZIOGAS, ALGIRDAS |
分类号 |
A61L31/02;A61L31/14 |
主分类号 |
A61L31/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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