| 摘要 |
PROBLEM TO BE SOLVED: To suppress an unevenness of a developer layer on a developer holding body arising from a rotation of a supply member.SOLUTION: A development device 100 comprises: a development sleeve 106B; a magnet roll 106A; a trimmer 108 that regulates a thickness of a layer of developer G; a first auger 109 that supplies the developer G to the development sleeve 106B; and a shield block 110. The shield block 110 is arranged across tangents L1 and L2 and a line segment L3 which are drawn through a point A denoting a tip center of the trimmer 108, a point B denoting a tip center of pick-up pole S3 and a point C denoting a rotary shaft center of the first auger 109. In the development device 100, an acting force by a rotation of the first auger 109 with respect to the developer G entering between the development sleeve 106B and the trimmer 108 is blocked by the shield block 110. Thereby, the unevenness of the developer layer on the development sleeve 106B can be suppressed. |
