NOVEL OXIME ESTER COMPOUNDS, PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING THE SAME

摘要

The present invention relates to a novel oxime ester compound, a photopolymerization initiator comprising the oxime ester compound, and a photoresist composition comprising the oxime ester compound. More particularly, the oxime ester compound is represented by chemical formula 1. In chemical formula 1, A, R_1 to R_4, and n are the same as defined in the specification. When used as a photopolymerization initiator of a photoresist composition, the oxime ester compound exhibits superior sensitivity even with a small quantity, and has excellent physical properties such as a ratio of remaining film, pattern stability, chemical resistance, ductility, and the like. Thus, the oxime ester compound minimizes outgassing generated from the polymerization initiator, and reduces contamination and defects caused thereby.