Exposure method, exposure apparatus, and method for producing device

摘要

A liquid immersion exposure apparatus in which a substrate is exposed with an exposure beam, includes a projection optical system by which the substrate is exposed to the exposure beam, a first inlet disposed at a first position, which is capable of supplying a first liquid to a space adjacent to a bottom surface of the projection optical system, and a second inlet disposed at a second position which is different from the first position, the second inlet being capable of supplying a second liquid that is different from the first liquid to the space.

主权项

1. A liquid immersion exposure apparatus that exposes a substrate via a projection optical system and a liquid, the apparatus comprising:
a liquid immersion member provided surrounding an optical element of the projection optical system and configured to form, with the liquid, a liquid immersion area below the projection optical system, the optical element being arranged to be in contact with the liquid; a substrate stage having a holder to hold the substrate, the substrate stage being configured to move below the projection optical system such that the substrate is relatively moved with respect to the liquid immersion area that is maintained between the projection optical system and a portion of the substrate; and a driving system having an electromagnetic motor of which a portion is provided in the substrate stage, the driving system being configured to drive the substrate stage, in the relative movement, at least one of a velocity and an acceleration that are determined based on information about a contact angle between the substrate and the liquid of the liquid immersion area.