POLISHING METHOD AND POLISHING COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a polishing method which enables the achievement of both of smoothness and flatness on a material of a high hardness.SOLUTION: A method for polishing a material having a Vickers hardness of 1500 Hv or larger is provided. The polishing method comprises the steps of: performing a preliminary polishing with a preliminary polishing composition; and performing a finish polishing with a finish polishing composition. The relation between an oxidation reduction potential ORPof the preliminary polishing composition to a standard hydrogen electrode, and an oxidation reduction potential ORPof the finish polishing composition to the standard hydrogen electrode satisfies: ORP>ORP.SELECTED DRAWING: None