发明名称 |
Durable hydrophobic structured surface |
摘要 |
The present invention relates to a scratch-resistant micro- and/or nanostructured surface comprising a plurality of micro-scale and/or nano-scale surface elements, said surface being essentially unchanged when being subjected to 10 rubbing cycles according to A.A.T.C.C. test method 8-1972 using a cotton cloth and a total stamp weight of 300 g, and comprising a polymeric material having 1) an elongation at break of at least 10%, 2) an irreversible relative plastic deformation (permanent set) of less than 2% and a 3) a tensile strength of at least 5 MPa. The present invention furthermore relates to a hydrophobic micro- and/or nanostructured surface comprising a plurality of micro-scale and/or nano-scale surface elements and having a static contact angle against water of at least 90, said surface comprising a polymeric material having 1) an elongation at break of at least 10%, 2) an irreversible relative plastic deformation (permanent set) of less than 2% and a 3) a tensile strength of at least 5 MPa. |
申请公布号 |
US9339996(B2) |
申请公布日期 |
2016.05.17 |
申请号 |
US201113704043 |
申请日期 |
2011.06.30 |
申请人 |
3M Innovative Properties Company |
发明人 |
Hitschmann Guido;Kuehneweg Bernd |
分类号 |
D06N7/04;B29C59/16;B32B33/00;B29C43/02;B29C59/02;B82Y30/00;B29C43/22;B29C35/08;B29K105/00 |
主分类号 |
D06N7/04 |
代理机构 |
|
代理人 |
Pishko Adrian L. |
主权项 |
1. A hydrophobic micro- and/or nanostructured surface comprising a plurality of micro-scale and/or nano-scale surface elements and having a static contact angle against water of at least 90°, said surface being essentially unchanged when subjected to 10 rubbing cycles according to A.A.T.C.C. test method 8-1972 using a cotton cloth and a total overlying weight of 300 g, said surface comprising a polymeric material having
1) an elongation at break of at least 10%, 2) an irreversible relative plastic deformation (permanent set) of less than 2% and a 3) a tensile strength of at least 5 MPa, wherein the polymeric material is obtained by curing a UV- or electron beam curable precursor comprising a) at least 60 weight % of one or more crosslinkable oligomer and/or polymer compounds selected from a group comprising polyurethanes, polyacrylates, epoxy acrylates, silicone acrylates, and polyether acrylates, b) 2-40 weight % of one or more reactive diluents selected from a group of UV-curable monomers containing one or more acrylate, methacrylate or vinyl groups, c) 0.2-5 weight % of one or more hydrophobic additives selected from a group of additives comprising silicones, fluorochemicals and long-chain alkyl compounds, and d) 0-5 weight % of one or more photoinitiators. |
地址 |
St. Paul MN US |