Processing System Containing An Isolation Region separating a Deposition chamber from a treatment chamber

摘要

An apparatus and method for processing a substrate in a processing system containing a deposition chamber, a treatment chamber, and an isolation region, separating the deposition chamber from the treatment is described herein. The deposition chamber deposits a film on a substrate. The treatment chamber receives the substrate from the deposition chamber and alters the film deposited in the deposition chamber with a film property altering device. Processing systems and methods are provided in accordance with the above embodiment and other embodiments.

主权项

1. A processing system, comprising:
a deposition chamber, wherein the deposition chamber is configured to deposit a film on a substrate; a treatment chamber, wherein the treatment chamber is arranged to receive substrates from the deposition chamber and pass substrates away from the deposition chamber, the treatment chamber further comprising:
a film property altering device operable to treat the substrate disposed in the treatment chamber to alter the property of the film deposited in the deposition chamber; and at least one isolation region, wherein the isolation region is configured to separate the deposition chamber from the treatment chamber.