| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate polishing device that is advantageous for improving polishing efficiency and space saving.SOLUTION: A substrate polishing device 100 comprises a substrate holder 10 for holding a substrate S and a polishing pad holder 50 for holding a polishing pad P; and brings the substrate S into contact with the polishing pad P to polish the substrate S with the polishing pad P. The substrate holder 10 comprises: a ring gear 12 having inner teeth 121 in an inner periphery thereof; a pinion gear 13 that is provided inside the ring gear 12 and has outer teeth 131 engaging with the inner teeth 121 of the ring gear 12; a cam shaft 14 that makes the ring gear 12 revolve with a central axis Oof the pinion gear 13 as a revolution center while maintaining engagement of the ring gear 12 with the pinion gear 13 and thus, rotates the ring gear 12; and a substrate holding member 11 fixed to the ring gear 12 and used for holding the substrate S.SELECTED DRAWING: Figure 1 |
