发明名称 Composition for forming resist underlayer
摘要 The present invention provides a dendrimer compound capable of improving critical dimension uniformity and DOF (depth of focus) margin, and also provides a composition capable of forming an underlayer film. The dendrimer compound comprises a branched chain having a central aromatic skeleton and amide or ester bond, and is contained in the composition for forming an underlayer film.
申请公布号 US9328198(B2) 申请公布日期 2016.05.03
申请号 US201414514728 申请日期 2014.10.15
申请人 AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. 发明人 Nakasugi Shigemasa;Suzuki Masato;Li Jin;Misumi Motoki;Ide Yasuaki
分类号 G03F7/11;C08G69/44;G03F7/30;H01L21/027;G03F7/20;C09D177/10;C08G69/12;C08G69/48 主分类号 G03F7/11
代理机构 代理人 Brustein Mitchell
主权项 1. A dendrimer compound represented by the following formula (1): Ar1(—Z1)m1-k1(-L1′p1-L1-L1′p1-A)k1  (1) in which Ar1 is an aromatic skeleton selected from the group consisting of benzene skeleton, naphthalene skeleton and anthracene skeleton;each Z1 is hydrogen, a hydrocarbon group of 1 to 3 carbon atoms or a halogen provided that the plural Z1s may be the same or different from each other;each L1 is amide bond or ester bond provided that the plural L1s may be the same or different from each other;each L1′ is a divalent linking group selected from the group consisting of a hydrocarbon chain having 1 to 3 carbon atoms, an oxygen-containing hydrocarbon chain having 1 to 3 carbon atoms, and a sulfur-containing hydrocarbon chain having 1 to 3 carbon atoms, and may be a straight chain or a branched chain provided that the plural L1′s may be the same or different from each other;m1 is 6 if Ar1 is benzene skeleton, 8 if Ar1 is naphthalene skeleton or 10 if Ar1 is anthracene skeleton;k1 is a number of 2 or more but not more than m1;each p1 is 0 or 1 provided that the plural p1s may be the same or different from each other; andA is a group represented by the following formula (2): —Ar2(—Z2)m2-k2(-L2′p2-L2-L2′p2-B)k2  (2) in which Ar2 is an aromatic skeleton selected from the group consisting of benzene skeleton, naphthalene skeleton and anthracene skeleton;each Z2 is hydrogen, a hydrocarbon group of 1 to 3 carbon atoms or a halogen provided that the plural Z2s may be the same or different from each other;each L2 is amide bond or ester bond provided that the plural L2s may be the same or different from each other;each L2′ is a divalent linking group selected from the group consisting of a hydrocarbon chain having 1 to 4 carbon atoms, an oxygen-containing hydrocarbon chain having 1 to 4 carbon atoms, and a sulfur-containing hydrocarbon chain having 1 to 4 carbon atoms, and may be a straight chain or a branched chain provided that the plural L2′s may be the same or different from each other;m2 is 5 if Ar2 is benzene skeleton, 7 if Ar2 is naphthalene skeleton or 9 if Ar2 is anthracene skeleton;k2 is a number of 1 or more but not more than m2;each p2 is 0 or 1 provided that the plural p2s may be the same or different from each other; andB is a group represented by the above formula (2) or by the following formula (3A) or (3B): —Ar3(—Z3)m3  (3A)—R3  (3B) in which Ar3 is an aromatic skeleton selected from the group consisting of benzene skeleton, naphthalene skeleton and anthracene skeleton;each Z3 is a group selected from the group consisting of hydrogen, a hydrocarbon group of 1 to 4 carbon atoms, a halogen, carboxyl group and ester group, provided that the plural Z3s may be the same or different from each other;m3 is 5 if Ar3 is benzene skeleton, 7 if Ar3 is naphthalene skeleton or 9 if Ar3 is anthracene skeleton; andR3 is a hydrocarbon group of 1 to 4 carbon atoms which may be substituted with a halogen; and further wherein the dendrimer compound is further selected from the group consisting of a), b), c) d) e), f) and g; a) the dendrimer compound, wherein all of said p1s are 0, the number of generation is 10 or less, said Ar1 is benzene skeleton, K1 is 3 and the halogens in Z3 and R3 are selected from the group consisting of fluorine, chlorine, bromine, and iodine; b) the dendrimer compound, wherein all of said p1s are 0, the number of generation is 10 or less, said Ar1 is benzene skeleton, K1 is 3 and the halogens in Z3 and R3 are selected from the group consisting of fluorine and iodine; c) the dendrimer compound wherein all of said p1s are 0, the number of generation is 10 or less, said Ar1 is benzene skeleton, K1 is 3, Ar2 is benzene skeleton, K2 is 3 or 2, Ar3 is a benzene skeleton, and the halogens in Z3 and R3 are selected from the group consisting of fluorine, chlorine, bromine, and iodine; d) the dendrimer compound wherein all of said p1s are 0, the number of generation is 10 or less, said Ar1 is benzene skeleton, K1 is 3, Ar2 is benzene skeleton, K2 is 3 or 2, Ar3 is a benzene skeleton, and the halogens in Z3 and R3 are selected from the group consisting of fluorine and iodine; e) the dendrimer compound wherein all of said p1s are 0, the number of generation is 6 or less, said Ar1 is benzene skeleton, K1 is 3, Ar2 is benzene skeleton, K2 is 3 or 2, Ar3 is a benzene skeleton, and the halogens in Z3 and R3 are selected from the group consisting of fluorine and iodine; f) the dendrimer compound wherein all of said p1s are 0, the number of generation is 10 or less, said Ar1 is benzene skeleton, K1 is 3, Ar2 is benzene skeleton, K2 is 3 or 2, and Z2 is fluorine, chlorine, bromine, or iodine; and g) the dendrimer compound wherein all of said p1s are 0, the number of generation is 10 or less, said Ar1 is benzene skeleton, K1 is 3, Ar2 is benzene skeleton, K2 is 3 or 2, and Z2 is iodine or fluorine.
地址 Luxembourg LU