| 摘要 |
This substrate treatment method involves performing: a liquid treatment step for liquid-treating a substrate with a treatment liquid; a rinse treatment step for rinsing the liquid-treated substrate with a rinsing liquid; a water-repellency treatment step for subjecting the rinsed substrate to a water-repellency treatment using a water-repellency-imparting solution; next, a cleaning treatment step for cleaning the substrate subjected to the water-repellency treatment by using functional water; thereafter, an alcohol treatment step for contacting alcohol and the cleaned substrate with one another; and thereafter, a drying treatment step for drying the substrate. Furthermore, the cleaning treatment step makes it possible to remove impurities remaining on the surface of the substrate subjected to the water-repellency treatment. |
