WET CLEAN PROCESS FOR CLEANING PLASMA PROCESSING CHAMBER COMPONENTS

摘要

PROBLEM TO BE SOLVED: To provide a system and method of cleaning a component of a plasma processing chamber.SOLUTION: The method includes removing the component from the plasma processing chamber, the removed component including a material deposited on the surface of the component. A heated oxidizing solution is applied to the material deposited on the component to oxidize a first portion of the deposited material. A stripping solution is applied to the component to remove the oxidized first portion of the deposited material. An etching solution is applied to remove a second portion of the deposited material, and the cleaned component can be rinsed and dried.SELECTED DRAWING: Figure 3A