PROCESSING METHOD OF SUBSTRATE, PROCESSED SUBSTRATE, MANUFACTURING METHOD OF ELECTRONIC COMPONENT, ELECTRONIC COMPONENT, ELECTRONIC APPARATUS AND MOVABLE BODY

摘要

PROBLEM TO BE SOLVED: To provide a processing method of a substrate effectively preventing an unnecessary deposit from remaining on the substrate subsequent to dry etching while stably fixing the substrate at the time of dry etching, and further to provide a processed substrate having a desired pattern and preventing an unintended deposit from remaining.SOLUTION: A processing method of a substrate includes: a step 1a of fixing a substrate 1 being coated with a mask 4 with a predetermined pattern via a metal film 2 on a support member 3 and being constituted of an inorganic material; a dry etching step 1b of fixing the support member 3 to a stage 5 of a dry etching device and applying dry etching thereto in a state of the substrate 1 being supported by the support member 3 via the metal film 2; and a separating step 1c of dissolving a metallic material constituting the metal film 2 and separating the substrate 1 applied with the dry etching from the support member 3.SELECTED DRAWING: Figure 1