发明名称 |
SURFACE EMITTING SEMICONDUCTOR LASER, SURFACE EMITTING SEMICONDUCTOR LASER MANUFACTURING METHOD, SURFACE EMITTING SEMICONDUCTOR LASER DEVICE, OPTICAL TRANSMISSION DEVICE AND INFORMATION PROCESSING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a surface emitting semiconductor laser which can make it easy to control inclination of an end of an oxidized region in a current confinement layer.SOLUTION: A surface emitting semiconductor layer has an n-type lower DBR, an active region 104 and a p-type upper DBR 106 on a substrate. The upper DBR 106 includes in a bottom layer, a current confinement layer 108 adjacent to the active region 104. The current confinement layer 108 has a high-speed oxidation layer 108-1 composed of AlAs, a taper formation layer 108-2 formed just below the high-speed oxidation layer 108-1 and a composition gradient layer 108-3 formed on the high-speed oxidation layer 108-1. The maximum value of an Al content of the composition gradient layer 108-3 is smaller than an Al content of the high-speed oxidation layer 108-1.SELECTED DRAWING: Figure 2 |
申请公布号 |
JP2016046453(A) |
申请公布日期 |
2016.04.04 |
申请号 |
JP20140171319 |
申请日期 |
2014.08.26 |
申请人 |
FUJI XEROX CO LTD |
发明人 |
TAKEDA KAZUTAKA;HAYAKAWA JUNICHIRO;MURAKAMI AKEMI;SHIROKISHI NAOTERU;KONDO TAKASHI;SAKURAI ATSUSHI |
分类号 |
H01S5/183 |
主分类号 |
H01S5/183 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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