COATING FILM, MANUFACTURING METHOD FOR SAME, AND PVD DEVICE

摘要

Provided are a coating film, a manufacturing method for the same, and a PVD device that not only sufficiently improve the balance of low-friction properties and wear resistance, but also improve chipping resistance (defect resistance) and peeling resistance. This coating film coats a substrate surface, wherein a hard carbon layer is formed extending in columns perpendicular to the substrate when observed in a cross-sectional bright-field TEM image, the hard carbon layer is formed using a PVD method, and the ID/IG ratio is 1-6, said ratio being the ratio of the Raman spectrum D band peak area intensity and G band peak area intensity when the hard carbon layer is measured using Raman spectroscopy. The coating film manufacturing method and the device use an arc PVD method, and while controlling the bias voltage, arc current, heater temperature and/or furnace pressure to maintain a substrate temperature of 250-400°C, also coat the substrate surface with the hard carbon film by rotating and/or revolving the substrate.