发明名称 Thin film transistor array substrate for digital photo-detector
摘要 A thin film transistor array substrate for a digital photo-detector is provided. The photo-detector includes a plurality of gate lines to supply a scan signal; a plurality of data lines to output data, the data lines arranged in a direction crossing the gate lines, wherein cell regions are defined by the gate lines and the data lines; a photodiode in each of the cell regions to perform photoelectric conversion; a thin film transistor at each intersection between the gate lines and the data lines to output a photoelectric conversion signal from the photodiode to the data lines in response to a scan signal supplied by the gate lines; and a light-shielding layer over each channel region of the respective thin film transistors. Each light-shielding layer is electrically connected to the respective gate line.
申请公布号 US9287315(B2) 申请公布日期 2016.03.15
申请号 US201314086034 申请日期 2013.11.21
申请人 LG Display Co., Ltd. 发明人 Kim Dae-Kyu;Ha Sung-Bong
分类号 H01L31/115;H01L27/146;H01L27/30 主分类号 H01L31/115
代理机构 Morgan, Lewis & Bockius LLP 代理人 Morgan, Lewis & Bockius LLP
主权项 1. A thin film transistor array substrate for a digital photo-detector, comprising: a plurality of gate lines to supply a scan signal; a plurality of data lines to output data, the data lines arranged in a direction crossing the gate lines, wherein cell regions are defined by the gate lines and the data lines; a photodiode in each of the cell regions to perform photoelectric conversion; a thin film transistor at each intersection between the gate lines and the data lines to output a photoelectric conversion signal from the photodiode to the data lines in response to a scan signal supplied by the gate lines; and a light-shielding layer over each channel region of the respective thin film transistors, each light-shielding layer electrically connected to the respective gate line, wherein the photodiode includes, in order, a first electrode, a semiconductor layer, and a second electrode; and wherein the light-shielding layer includes the same material as the first electrode of the photodiode.
地址 Seoul KR