| 摘要 |
A system and a method for monitoring plasma by using an optical sensor to determine operations of a pulsed radio frequency (RF) signal for plasma processing, include a plasma chamber with an optical sensor directed toward a plasma region. An RF generator is coupled to the plasma chamber through a matching circuit. An RF timing system is coupled to the RF generator. A system controller is coupled to the plasma chamber, the RF generator, the optical sensor, the RF timing system, and the matching circuit. The system controller includes: a central processing unit; a memory system; a set of RF generator settings; and an optical pulsed plasma analyzer coupled to the optical sensor, and enabling to determine a timing of a change in state of an optical emission received in the optical sensor and/or a set of amplitude statistics corresponding to an amplitude of the optical emission received in the optical sensor. |
