发明名称 A field effect transistor device, and methods of production thereof
摘要 The invention is related to a semiconductor transistor device comprising : - a channel area (1), said channel area comprising a channel layer in which charge carriers can move when the transistor is turned on, in order to pass a current through the transistor, - a source area (4) and a drain area (5), contacting the channel layer for providing current to and from said channel layer, - a gate electrode (3), preferably provided with a gate dielectric (2) between the gate electrode and the channel layer, wherein said channel layer consists of a III-V material, and said source and drain areas comprise SiGe, being Si x Ge 1-x , with x between 0 and 100%, arranged so that heterojunctions (30,31) are present between III-V material and SiGe, wherein said heterojunctions (30,31) are oriented so as to intersect with said gate dielectric (2) or said gate electrode.
申请公布号 EP1936697(B1) 申请公布日期 2016.03.09
申请号 EP20070150279 申请日期 2007.12.20
申请人 IMEC 发明人 HEYNS, MARC;MEURIS, MARC
分类号 H01L29/778;H01L21/336;H01L21/338;H01L29/78 主分类号 H01L29/778
代理机构 代理人
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