| 发明名称 | Fluorine-based resins and photosensitive resin composition comprising the same | ||
| 摘要 | The present application relates to a fluorine-based resin having a novel structure and a photosensitive resin composition including the same. The photosensitive resin composition including the fluorine-based resin according to an exemplary embodiment of the present application has excellent photosensitivity and developability and can increase a contact angle of a coating film to prevent a water stain. Accordingly, the photosensitive resin composition including the fluorine-based resin according to the exemplary embodiment of the present application may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured. | ||
| 申请公布号 | US9274423(B2) | 申请公布日期 | 2016.03.01 |
| 申请号 | US201214237139 | 申请日期 | 2012.05.31 |
| 申请人 | LG CHEM, LTD. | 发明人 | Kim Minjung;Kim Han Soo;Choi Kyung Soo |
| 分类号 | C08F18/20;G03F7/027;G03F7/20;G03F7/038;C08F14/18;C09D4/06;C08F220/18;G03F7/004;G03F7/033;C08F214/18;C08F222/10;C09D4/00;G03F7/00 | 主分类号 | C08F18/20 |
| 代理机构 | Rothwell, Figg, Ernst & Manbeck, P.C. | 代理人 | Rothwell, Figg, Ernst & Manbeck, P.C. |
| 主权项 | 1. A fluorine-based resin represented by the following Formula 14: wherein a, b, c, d, e and f are a mole mixing ratio, a is 5 to 30, b is 5 to 30, c is 10 to 60, 0<d≦20, 0<e≦20, and 0<f≦70. | ||
| 地址 | Seoul KR | ||