发明名称 |
BARRIER FILM STRUCTURE AND ORGANIC ELECTRONIC DEVICE HAVING THE SAME |
摘要 |
The present invention relates to: a barrier film structure which can effectively prevent inflow of moisture or oxygen from the atmosphere and can prevent the generation of cracks by stress; and an organic electronic device having the same. The barrier film structure comprises: a base film; at least one aluminum oxynitride (Al_xO_yN_z) layer disposed on the base film; and at least one silicon oxide (SiO_n) layer which faces at least one surface of the aluminum oxynitride layer for alleviating stress induced from the aluminum oxynitride layer. |
申请公布号 |
KR20160020839(A) |
申请公布日期 |
2016.02.24 |
申请号 |
KR20140106078 |
申请日期 |
2014.08.14 |
申请人 |
LS MTRON LTD. |
发明人 |
KIM, TAE HYUN;CHO, WON JE;KIM, KYUNG KAK;SHIN, CHUNG HWAN |
分类号 |
B32B27/06;B32B15/08;H01L51/42;H01L51/50 |
主分类号 |
B32B27/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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