Apparatus for controlling the temperature uniformity of a substrate

摘要

Apparatus for controlling the thermal uniformity of a substrate. In some embodiments, the thermal uniformity of the substrate is controlled to be more uniform. In some embodiments, the thermal uniformity of the substrate is controlled to be non-uniform in a desired pattern. In some embodiments, an apparatus for controlling thermal uniformity of a substrate includes a substrate support having a support surface to support a substrate thereon. A plurality of flow paths having a substantially equivalent fluid conductance are disposed within the substrate support to flow a heat transfer fluid beneath the support surface.

主权项

1. An apparatus for controlling the thermal uniformity of a substrate, comprising:
a substrate support having a support surface to support a substrate thereon; and a plurality of flow paths having a substantially equivalent fluid conductance disposed within the substrate support to flow a heat transfer fluid beneath the support surface, wherein each of the plurality of flow paths winds radially inwardly in a reciprocating manner toward a center of the substrate support in a first direction, and, prior to reaching the center, subsequently winds radially outwardly in a reciprocating manner toward a periphery of the substrate support in a second direction different than the first direction.