发明名称 |
Electronic devices utilizing contact pads with protrusions and methods for fabrication |
摘要 |
An electronic device includes a substrate including a front side, a back side, a thickness between the front side and back side, one or more front-side vias extending from the front side into a part of the thickness, and an interconnect via extending from the back side toward the front side; a contact pad on the front side and including one or more protrusions extending through corresponding front-side vias and into the interconnect via; and an interconnect extending through the interconnect via and into contact with the protrusion(s). |
申请公布号 |
US9257335(B2) |
申请公布日期 |
2016.02.09 |
申请号 |
US201314426302 |
申请日期 |
2013.09.04 |
申请人 |
Research Triangle Institute |
发明人 |
Vick Erik;Cunningham Garry Brian;Temple Dorota |
分类号 |
H01L21/768;H01L23/48;H01L23/00 |
主分类号 |
H01L21/768 |
代理机构 |
Olive Law Group, PLLC |
代理人 |
Olive Law Group, PLLC ;Gloekler David P. |
主权项 |
1. A method for fabricating an electronic device, the method comprising:
forming a front-side via in a substrate, the substrate comprising a front side, a back side and a thickness between the front side and the back side, wherein the front-side via extends from the front side into a part of the thickness; forming a contact pad comprising a protrusion, by depositing a contact pad material on the front side such that the contact pad material fills the front-side via; forming an interconnect via by etching the substrate from the back side until exposing the protrusion in the interconnect via; and forming an interconnect in contact with the contact pad by depositing an interconnect material in the interconnect via such that the interconnect material is at least conformally disposed on a portion of the back side surrounding the interconnect via, on a wall of the substrate circumscribing a cross-section of the interconnect via, and on the protrusion. |
地址 |
Research Triangle Park NC US |