发明名称 Immersion exposure apparatus and method with detection of liquid on members of the apparatus
摘要 An exposure apparatus which prevents the damage due to the liquid having flowed out from spreading and enables satisfactory performances of the exposure processes and the measurement processes is provided. An exposure apparatus (EX) includes a movable table (PT), a base member (41) having an upper surface (41A) that guides the movement of the table (PT), and a detecting device (60) that detects whether there is a liquid on the upper surface (41A) of the base member (41).
申请公布号 US9250537(B2) 申请公布日期 2016.02.02
申请号 US201313742743 申请日期 2013.01.16
申请人 Nikon Corporation 发明人 Shibuta Makoto
分类号 G03F7/20 主分类号 G03F7/20
代理机构 Shapiro, Gabor and Rosenberger, PLLC 代理人 Shapiro, Gabor and Rosenberger, PLLC
主权项 1. An exposure apparatus that exposes a substrate via a projection optical system and a liquid, comprising: a movable member that is configured to move relative to a predetermined member; and a detection device that is supported by the movable member and is configured to detect whether there is any of the liquid on and in contact with a predetermined surface of the predetermined member, which is other than the movable member, the exposure apparatus being configured such that the substrate is moved relative to and above the predetermined surface of the predetermined member during exposure of the substrate.
地址 Tokyo JP