发明名称 |
MAGNETORESISTIVE RANDOM ACCESS DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
A magnetoresistive random access memory device of the present invention comprises semiconductor structures which include a first semiconductor pattern in a line shape which is extended in a first direction of a substrate, and second semiconductor patterns which protrude in a third direction perpendicular to an upper plane of the first semiconductor pattern, and have the first and the second semiconductor patterns arranged in parallel in a second direction perpendicular to the first direction on the substrate; a common source line and a drain region arranged separately from each other in a third direction in the semiconductor structures; and a channel region arranged between the common source line and the drain region. The magnetoresistive random access memory device also comprises: gate structures used as a common gate between second semiconductor patterns facing each other in the second direction; word line structures electrically connecting the gate structures in the first direction; MTJ structures individually and electrically connected to an upper part of the second semiconductor patterns; and a bit line structure for electrically connecting two neighboring MTJ structures in the first direction and MTJ structures arranged in the second direction. |
申请公布号 |
KR20160010058(A) |
申请公布日期 |
2016.01.27 |
申请号 |
KR20140090858 |
申请日期 |
2014.07.18 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, EUN JUNG;JANG, SE MYEONG;KIM, DAE IK;PARK, JE MIN;HWANG, YOO SANG |
分类号 |
H01L27/115;H01L21/8247;H01L43/08 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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