ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME

摘要

Provided is an acid generator compound which is useful as a component in a photoresist composition. The acid generator compound of the present invention comprises: (1) a cyclic sulfonium salt; and (2) a covalently bonded photoacid-labile group. In one aspect, thioxanthone acid generator compound is especially desirable, wherein the acid generator compound, for example, comprises: (i) a thioxanthone residue; and (ii) an acid-labile group containing at least one covalent bond.