| 发明名称 |
DIP CORRECTION USING ESTIMATED FORMATION LAYER RESISTIVITIES |
| 摘要 |
In some embodiments, an apparatus and a system, as well as a method and an article, may operate to determine apparent resistivity values of the formation associated with each of several layers comprising a set of at least three layers; to determine a resistivity correction for a selected one of the layers based on at least one of the apparent resistivity value of the selected layer, the width of the selected layer, and the apparent resistivity values in layers of the set located above and below the selected layer in the set within which the apparent resistivity value was obtained; and to generate a dip corrected resistivity value associated with the selected layer, based on the resistivity correction. Methods described herein may operate without using inversion-based or filter-based methods of dip correction. Additional apparatus, systems, and methods are disclosed. |
| 申请公布号 |
US2016018553(A1) |
申请公布日期 |
2016.01.21 |
| 申请号 |
US201414424090 |
申请日期 |
2014.01.13 |
| 申请人 |
HALLIBURTON ENERGY SERVICES, INC. |
发明人 |
Celepcikay Ferhat Turker;San Martin Luis Emilio;Donderici Burkay |
| 分类号 |
G01V3/28;G01V3/38 |
主分类号 |
G01V3/28 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for evaluating a formation, the method comprising:
obtaining apparent resistivity values of the formation associated with each of several layers comprising a set of at least three layers; determining a resistivity correction for a selected one of the layers based on at least one of the apparent resistivity value of the selected layer, a width of the selected layer, and the apparent resistivity values in layers of the set located above and below the selected layer in the set within which the apparent resistivity value was obtained; and generating a dip corrected resistivity value associated with the selected layer, based on the resistivity correction. |
| 地址 |
Houston TX US |
