| 摘要 |
PROBLEM TO BE SOLVED: To provide a deposition device which performs batch type ALD deposition by suppressing reduction in production tact as much as possible, enhancing a utilization efficiency of process gas, and suppressing generation of reaction products in an exhaust path without increasing a gas supply amount.SOLUTION: A batch type deposition device 100 comprises: a plurality of processing chambers 15; a gas supply unit 2; an exhaust unit 3; and a controller 4. The exhaust unit 3 has two exhaust paths respectively corresponding to a first process gas and a second process gas, and exhaust path switching parts 34 and 35 for switching between the two exhaust paths. When supplying the first process gas and the second process gas from the gas supply unit 2 to the processing chamber 15, the controller 4 controls the gas supply unit 2 so that one process gas is sequentially supplied to each processing chamber with a time difference, and controls the exhaust path switching parts 34 and 35 so that the one process gas is exhausted via an exhaust path corresponding to the process gas supplied to each processing chamber 15. |
