| 摘要 |
The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, the apparatus including a stage configured to hold the substrate and to be moved, a charged particle optical system including a deflector configured to deflect the plurality of charged particle beams, a detector configured to detect a charged particle arrived thereat by causing a charged particle beam to impinge on a mark including a plurality of mark elements formed on one of the substrate and the stage, and a processor configured to perform a process of obtaining a position of the mark. |
