| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an abrasive and a polishing method which are capable of rapidly polishing a surface to be polished of an inorganic insulating film layer or the like while suppressing generation of polishing scratches. <P>SOLUTION: The abrasive contains metal oxide particles and a medium. The metal oxide particles include metal oxide particles obtained by firing a metal oxide produced by heating a mixture containing a metal salt, a polymer compound, and a high boiling point organic solvent. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
