Composition for photoresist development and method of developing photoresist using the same

摘要

The present invention provides a composition for developing a photoresist containing a carboxyl group (—COOH) and a method of developing a photoresist using the composition. The composition includes: a first solution including a salt containing a monovalent cationic component; and a second solution including a salt containing a bivalent cationic component. The composition for photoresist development is advantageous in that the developing depth of a photoresist can be controlled, and the developed surface of a photoresist is flat, thereby enabling the photoresist to be developed to realize precise three-dimensional packaging.

主权项

1. A developer composition, comprising:
60 to 99.99 vol % of a metal salt solution; and 0.01 to 40 vol % of a dissolution inhibitor, wherein the metal salt solution is a metal salt solution containing a monovalent cation wherein the metal salt containing a monovalent cation is included in an amount of 1 to 300 g per L of pure water (H2O).