Photoresist and Method of Manufacture

摘要

A system and method for anti-reflective layers is provided. In an embodiment the anti-reflective layer comprises a floating additive in order to form a floating additive region along a top surface of the anti-reflective layer after the anti-reflective layer has dispersed. The floating additive may comprise an additive group which will decompose along with a fluorine unit bonded to the additive group which will decompose. Additionally, adhesion between the middle layer and the photoresist may be increased by applying an adhesion promotion layer using either a deposition process or phase separation, or a cross-linking may be performed between the middle layer and the photoresist.

主权项

1. A method of manufacturing a semiconductor device, the method comprising:
dispensing an anti-reflective material over a substrate to form an anti-reflective coating layer, the anti-reflective material having a first concentration of a floating additive, wherein the floating additive further comprises:
a group to be decomposed; anda fluorine group bonded to the group to be decomposed; and forming a floating region adjacent to a top surface of the anti-reflective coating, the floating region having a second concentration of the floating additive greater than the first concentration.