| 摘要 |
The difference between a setting temperature of an object to be processed and a setting temperature of a focus ring is made large. According to an embodiment, provided is a placing table configured to place the object to be processed thereon. The placing table comprises: an electrostatic chuck configured to absorb the object to be processed; a support part configured to support a focus ring; and a metal base having a first region configured to support the electrostatic chuck and a second region configured to support the support member wherein the second region surrounds the first region. The support part comprises: an intermediate layer made of a ceramic sintered object and supported on the second region via an adhesive; a thermally sprayed ceramic layer formed on the intermediate layer by a thermal spraying method; and a heater electrode installed in the thermally sprayed ceramic layer and formed by the thermal spraying method. |
