发明名称 Method and system for galvanizing by plasma evaporation
摘要 The invention relates to a method and a system for the plasma treatment of successive substrates comprising one or more steel products in which the substrates are transported, one after another, through at least one plasma treatment zone, characterized in that the electric power for generating the plasma in the treatment zone is varied according to the area of the substrate is present in this treatment zone when the substrate is running through this zone.
申请公布号 US9222162(B2) 申请公布日期 2015.12.29
申请号 US200812743627 申请日期 2008.11.07
申请人 ADVANCED GALVANISATION AG 发明人 Vanden Brande Pierre
分类号 H05H1/00;C23C2/36;C23C2/00;C23C14/32;C23C14/54;C23C14/56 主分类号 H05H1/00
代理机构 Browdy and Neimark, PLLC 代理人 Browdy and Neimark, PLLC
主权项 1. A method for the plasma treatment of successive substrates, wherein each substrate comprises one or more steel products, comprising transporting the substrates one after the other through at least one plasma treatment zone (3,4,5), varying the electrical power supplied to generate the plasma in the treatment zone (3,4,5) progressively and proportionally according to the area of the substrate present in the treatment zone (3,4,5) while the substrate is entering the treatment zone and while the substrate is leaving the treatment zone when the substrate is passing through the treatment zone (3,4,5), wherein the substrates are moved along a straight path through the treatment zone.
地址 Neuhausen CH