发明名称 |
TRANSISTOR WITH CHANNEL INCLUDING OXIDE LAYER AND QUANTUM LAYER |
摘要 |
Disclosed is a transistor including a channel comprising an oxide layer and a quantum dot layer. The disclosed transistor includes: a back gate substrate; a gate insulation layer on the substrate; a channel layer having a stacked structure comprising the oxide layer and a semiconductor nanolayer, on the gate insulation layer; and a source electrode and a drain electrode connected to both ends of the channel layer respectively. The semiconductor nanolayer can be a quantum dot layer or a semiconductor nanowire layer. |
申请公布号 |
KR20150142374(A) |
申请公布日期 |
2015.12.22 |
申请号 |
KR20140071069 |
申请日期 |
2014.06.11 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD.;KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION |
发明人 |
CHO, KYUNG SANG;HEO, KEUN |
分类号 |
H01L29/786;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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