发明名称 TRANSISTOR WITH CHANNEL INCLUDING OXIDE LAYER AND QUANTUM LAYER
摘要 Disclosed is a transistor including a channel comprising an oxide layer and a quantum dot layer. The disclosed transistor includes: a back gate substrate; a gate insulation layer on the substrate; a channel layer having a stacked structure comprising the oxide layer and a semiconductor nanolayer, on the gate insulation layer; and a source electrode and a drain electrode connected to both ends of the channel layer respectively. The semiconductor nanolayer can be a quantum dot layer or a semiconductor nanowire layer.
申请公布号 KR20150142374(A) 申请公布日期 2015.12.22
申请号 KR20140071069 申请日期 2014.06.11
申请人 SAMSUNG ELECTRONICS CO., LTD.;KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION 发明人 CHO, KYUNG SANG;HEO, KEUN
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
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