| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithographic apparatus advantageous in throughput.SOLUTION: The lithographic apparatus includes: an original plate transportation path; a substrate transportation path; and a plurality of formation parts each for forming a pattern on a substrate with the original plate. The plurality of formation parts are arranged in two columns. The substrate transportation path is provided between the two columns along the two columns. The original plate transportation paths are provided in two columns on both sides of the two columns along the two columns. |
