THIN FILM PATTERNING METHOD AND THIN FILM PATTERNING APPARATUS

摘要

Disclosed herein is a thin film patterning method and a thin film patterning apparatus. The thin film patterning method comprises the steps of: disposing a mask above a substrate, wherein the mask is provided with hollow-out parts which are identical with preset deposition patterns; and covering the mask with a thin film, wherein the thin film at hollow-out parts of the mask is formed on the substrate, while the remaining area of the substrate shielded by the mask is free of the thin film, so that a patterned thin film is formed on the substrate. The thin film patterning method in the present disclosure can transfer directly patterns on the mask to the substrate through one-step deposition, omit the process steps of photolithography and etching, simplify the process flow to a large extent, and save the costs of the thin film patterning.

主权项

1. A thin film patterning method, comprising:
disposing a mask above a substrate, wherein the mask is provided with hollow-out parts which are identical with preset deposition patterns; and covering the mask with a thin film, wherein the thin film at the hollow-out parts of the mask is formed on the substrate, while the remaining area of the substrate shielded by the mask is free of the thin film, so that a patterned thin film is formed on the substrate.