| 发明名称 |
DETERMINING A STATE OF A HIGH ASPECT RATIO HOLE USING MEASUREMENT RESULTS FROM AN ELECTROSTATIC MEASUREMENT DEVICE |
| 摘要 |
A system, method and a non-transitory compute readable medium for evaluating a high aspect ratio (HAR) hole having a nanometric scale width and formed in a substrate, including obtaining, during an illumination period, multiple measurement results by an electrostatic measurement device that comprises a probe tip that is placed in proximity to the HAR hole; wherein multiple locations within the HAR hole are illuminated with a beam of charged particles during the illumination period; and processing the multiple measurement results to determine a state of the HAR hole. |
| 申请公布号 |
US2015362524(A1) |
申请公布日期 |
2015.12.17 |
| 申请号 |
US201514719193 |
申请日期 |
2015.05.21 |
| 申请人 |
Applied Materials Israel, Ltd. |
发明人 |
Chirko Konstantin;Litman Alon |
| 分类号 |
G01Q60/30 |
主分类号 |
G01Q60/30 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for evaluating a high aspect ratio (HAR) hole having a nanometric scale width and formed in a substrate, the method comprises:
obtaining, during an illumination period, multiple measurement results by an electrostatic measurement device that comprises a probe tip that is placed in proximity to the HAR hole; wherein multiple locations within the HAR hole are illuminated with a beam of charged particles during the illumination period; and processing, by a processor, the multiple measurement results to determine a state of the HAR hole. |
| 地址 |
Rehovot IL |
